N2‐Plasma‐Assisted One‐Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir–Blodgett Technique

N. Chauhan, V. Palaninathan, S. Raveendran, A.C. Poulose, Y. Nakajima, T. Hasumura, T. Uchida, T. Hanajiri, T. Maekawa, D.S. Kumar

Research output: Contribution to journalArticle

Original languageEnglish
Article number1400515
JournalAdvanced Materials Interfaces
Volume2
Issue number5
DOIs
Publication statusPublished - 18 Feb 2015

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